Houston Science CenterBuilding 593 – (713) 743-8200
Date: Friday December 06, 2002
Time: 12:00 pm – 1:00 pm
Location: Houston Science Center – Building 593 — Room 102
Ion beam proximity (IBP) lithography is â€œstencil printingâ€ where helium ions are the â€œpaintâ€ and the stencils are thin silicon membranes with etched open windows. Diffraction, penumbral blur, and ion scattering in the resist are all consistent with 1 nm printing. However, the scattering of the lithography ions by electrostatic charge in the mask and substrate limit the practical resolution to the 50-100 nm regime. This seminar describes the discovery of a remarkable source of energetic helium atoms that eliminates this last obstacle to sub-10 nm printing. Applications to nanomagnetics and nanoelectronics will be discussed.
Download: Event PDF
Problems or feedback? Email: